科豐國際有限公司MAST Technology Corp.

 

          

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

以下為本公司之砷化鎵GaAs 與碳化矽SiC 晶錠或晶圓之一般規格表

HB-GaAs Ingot and Wafer (Diameter: 2”2.5”3”)

Parameters of HB-GaAs Ingot & Wafer

Conduct Type

Semi-conducting

Dopant

Si

Diameter

50.8±0.4mm; 63.5±0.4mm; 76.2±0.4mm

Wafer Orientation

10015°±0.5°off toward  (111)A

Carrier Concentration

(0.4-4)×1018cm-3

Resistivity (at RT)

(0.8-9)×10-3Ωcm

Mobility

1200cm2/Vs

Etch Pit Density(EPD)

≤5000cm-2

OF / IF

EJ / US

Surface Finish

Side1

Polished

Side2

L/E

Epi-Ready

Yes

Packing

Single or Cassette

l       Other orientation, thickness, or other parameters available upon request.

VGF GaAs Ingot and Wafer (Diameter: 2”3”4”)

Parameters of VGF-GaAs Ingot & Wafer

Conduct Type

Semi-conducting

Dopant

Si

Diameter

50.8±0.4mm; 76.2±0.4mm; 100±0.4mm

Wafer Orientation

(100)

Carrier Concentration

(0.4-4)×1018cm-3

Resistivity (at RT)

(0.8-9)×10-3Ωcm

Mobility

1200cm2/Vs

Etch Pit Density(EPD)

≤5000cm-2

OF / IF

EJ / US

Surface Finish

Side1

Polished

Side2

L/E

Epi-Ready

Yes

Packing

Single or Cassette

 

Conduct Type

Semi-insulating

Dopant

Undoped

Diameter

50.8±0.4mm; 76.2±0.4mm; 100±0.4mm

Wafer Orientation

(100)

Resistivity (at RT)

107Ωcm

Mobility

5000cm2/Vs

Etch Pit Density(EPD)

≤10000cm-2

OF / IF

EJ / US

Surface Finish

Side1

Polished

Side2

L/E

Epi-Ready

Yes

Packing

Single or Cassette

l       Other orientation, thickness, or other parameters available upon request.

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